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Wafer-scale fabrication of high-purity reduced graphene oxide films as ultrahigh-frequency capacitors with minimal self-discharge
Release time:2020-09-21 Hits:Journal:Chemical Engineering Journal
Indexed by:SCI
Discipline:Engineering
First-Level Discipline:Materials Science and Engineering
Document Type:Journal Paper
Volume:390
Page Number:124560
ISSN No.:1385-8947
Translation or Not:no
Date of Publication:2020-06-15
Included Journals:SCI
Gender:Female
Education Level:With Certificate of Graduation for Doctorate Study
Alma Mater:中国科学院兰州化学物理研究所
Degree:doctor
Status:Employed
School/Department:机械工程学院
Business Address:江苏省镇江市学府路301号江苏大学实践楼1212室
Contact Information:QQ: 254505540
E-Mail:hyliang@ujs.edu.cn